SELECTIVE OXIDATION AND CHEMICAL-STATE OF AL AND TI IN (TI, AL)N COATINGS

被引：78

作者：

HOFMANN, S

JEHN, HA

机构：

[1] Max-Planck-Inst fuer Metallforschung, Germany

来源：

SURFACE AND INTERFACE ANALYSIS | 1988年 / 12卷 / 1-12期

关键词：

Chemical Shift - Chemical State - Selective Oxidation - Sputter Depth Profiling - Titanium Aluminum Nitride - X-ray Photoelectron Spectroscopy;

D O I：

10.1002/sia.740120602

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：329 / 333

页数：5

共 24 条

[1] MICROSTRUCTURE AND PHYSICAL-PROPERTIES OF POLYCRYSTALLINE METASTABLE TI0.5AL0.5N ALLOYS GROWN BY DC MAGNETRON SPUTTER DEPOSITION [J].

HAKANSSON, G ;

SUNDGREN, JE ;

MCINTYRE, D ;

GREENE, JE ;

MUNZ, WD .

THIN SOLID FILMS, 1987, 153 :55-65

[2] QUANTIFICATION OF PREFERENTIAL SPUTTERING AND CONTAMINATION OVERLAYER EFFECTS IN AES SPUTTER PROFILING [J].

HOFMANN, S ;

SANZ, JM .

SURFACE AND INTERFACE ANALYSIS, 1984, 6 (02) :78-81

[3] CHARACTERIZATION OF NITRIDE COATINGS BY AUGER-ELECTRON SPECTROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

HOFMANN, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2789-2796

[4]

Hofmann S., 1982, J TRACE MICROPROBE T, V1, P213

[5]

Hofmann S, 1983, PRACTICAL SURFACE AN, P141

[6] MORPHOLOGY AND PROPERTIES OF SPUTTERED (TI,AL)N LAYERS ON HIGH-SPEED STEEL SUBSTRATES AS A FUNCTION OF DEPOSITION TEMPERATURE AND SPUTTERING ATMOSPHERE [J].

JEHN, HA ;

HOFMANN, S ;

RUCKBORN, VE ;

MUNZ, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2701-2705

[7] SURFACE AND INTERFACE CHARACTERIZATION OF HEAT-TREATED (TI,AL)N COATINGS ON HIGH-SPEED STEEL SUBSTRATES [J].

JEHN, HA ;

HOFMANN, S ;

MUNZ, WD .

THIN SOLID FILMS, 1987, 153 :45-53

[8]

JEHN HA, IN PRESS

[9] INDUSTRIAL DEPOSITION OF BINARY, TERNARY, AND QUATERNARY NITRIDES OF TITANIUM, ZIRCONIUM, AND ALUMINUM [J].

KNOTEK, O ;

MUNZ, WD ;

LEYENDECKER, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2173-2179

[10]

KNOTEK O, 1985, P INT C VACUUM METAL

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