HIGH-TEMPERATURE INTERACTION STUDIES OF C/CU/SIO2/SI AND RELATED STRUCTURES

被引:18
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CHANG, CA
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10.1063/1.344454
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O59 [应用物理学];
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页码:1163 / 1169
页数:7
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[1]  
BARCZ A, 1976, ION BEAM SURFACE LAY, P407
[2]   ION BACKSCATTERING ANALYSIS OF INTERDIFFUSION IN CU-AU THIN-FILMS [J].
BORDERS, JA .
THIN SOLID FILMS, 1973, 19 (02) :359-370
[3]   DETERMINATION OF CONCENTRATION PROFILE IN THIN METALLIC-FILMS - APPLICATIONS AND LIMITATIONS OF HE+ BACKSCATTERING [J].
CAMPISANO, SU ;
FOTI, G ;
GRASSO, F ;
RIMINI, E .
THIN SOLID FILMS, 1975, 25 (02) :431-440
[7]   CARBON AS A BARRIER FOR THE OUTDIFFUSION OF CU [J].
CHANG, CA ;
YEE, DS ;
PETKIE, R .
APPLIED PHYSICS LETTERS, 1989, 54 (25) :2545-2547
[8]   INTERACTIONS BETWEEN AU AND CU ACROSS A NI BARRIER LAYER [J].
CHANG, CA .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (03) :1220-1222
[9]   ENHANCED CU-TEFLON ADHESION BY PRESPUTTERING PRIOR TO THE CU DEPOSITION [J].
CHANG, CA ;
BAGLIN, JEE ;
SCHROTT, AG ;
LIN, KC .
APPLIED PHYSICS LETTERS, 1987, 51 (02) :103-105