EXPOSURE AND DEVELOPMENT MODELS USED IN ELECTRON-BEAM LITHOGRAPHY

被引：47

作者：

HAWRYLUK, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 01期

关键词：

D O I：

10.1116/1.571009

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1 / 17

页数：17

共 135 条

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