Water induced particle formation in the ion chemistry of silane

被引:9
作者
Reents, W. D., Jr. [1 ]
Mandich, M. L. [1 ]
机构
[1] AT&T Bell Labs, Murray Hill, NJ 07974 USA
关键词
D O I
10.1088/0963-0252/3/3/021
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Potential particle-forming reactions of hydrogenated silicon cations with silane and disilane, in the presence and absence of water, are summarized. The reactions are studied in the ion trap of a Fourier transform mass. spectrometer at 10(-7)-10(-5) Torr. Cations react sequentially with silane to produce larger silicon-containing ions. In general, reaction rates decrease with increasing number of silicon atoms in the ion; no ions containing more than six silicon atoms are formed in reactions with pure silane. Reaction with disilane produces larger silicon-containing ions; reaction rates decrease with increasing number of silicon atoms in the cation. The largest ion produced is larger than for tine silane system but still contains less than nine silicon atoms. There is insufficient reactivity for hydrogenated silicon cations in pure silane or disilane to produce macroscopic particles. Mixtures of silane or disilane containing 7% water, however, significantly enhance the growth of ions. In the limit of our measurements, the reactions in both silane and disilane do not terminate.
引用
收藏
页码:373 / 380
页数:8
相关论文
共 20 条
[1]  
BUCHANAN MV, 1993, ANAL CHEM, V65, P245
[2]   ION CHEMISTRY IN SILANE DC DISCHARGES [J].
CHATHAM, H ;
GALLAGHER, A .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) :159-169
[3]   THEORETICAL-STUDY OF SI2HN (N=0-6) AND SI2HN+ (N=0-7) - APPEARANCE POTENTIALS, IONIZATION-POTENTIALS, AND ENTHALPIES OF FORMATION [J].
CURTISS, LA ;
RAGHAVACHARI, K ;
DEUTSCH, PW ;
POPLE, JA .
JOURNAL OF CHEMICAL PHYSICS, 1991, 95 (04) :2433-2444
[4]   ON THE DECOMPOSITION OF SILANE IN PLASMA DEPOSITION REACTORS [J].
DEJOSEPH, CA ;
HAALAND, PD ;
GARSCADDEN, A .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) :165-172
[5]   INFRARED RADIATIVE COOLING OF GAS-PHASE IONS [J].
DUNBAR, RC .
MASS SPECTROMETRY REVIEWS, 1992, 11 (04) :309-339
[6]  
EVERSTEIJN FC, 1971, PHILIPS RES REP, V26, P134
[7]   OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE [J].
HO, P ;
BREILAND, WG .
APPLIED PHYSICS LETTERS, 1984, 44 (01) :51-53
[8]   NEGATIVE HYDROGENATED SILICON ION CLUSTERS AS PARTICLE PRECURSORS IN RF SILANE PLASMA DEPOSITION EXPERIMENTS [J].
HOWLING, AA ;
SANSONNENS, L ;
DORIER, JL ;
HOLLENSTEIN, C .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1993, 26 (06) :1003-1006
[10]   SEQUENTIAL CLUSTERING REACTIONS OF SID3+ WITH SID4 AND SIH3+ WITH SIH4 - ANOTHER CASE OF ARRESTED GROWTH OF HYDROGENATED SILICON PARTICLES [J].
MANDICH, ML ;
REENTS, WD ;
KOLENBRANDER, KD .
JOURNAL OF CHEMICAL PHYSICS, 1990, 92 (01) :437-451