ELECTRON-BEAM ASSISTED ADSORPTION ON SI(111) SURFACE

被引:115
作者
COAD, JP
BISHOP, HE
RIVIERE, JC
机构
关键词
D O I
10.1016/0039-6028(70)90232-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:253 / &
相关论文
共 17 条
[1]   CLEANING OF SILICON SURFACES BY HEATING IN HIGH VACUUM [J].
ALLEN, FG ;
EISINGER, J ;
HAGSTRUM, HD ;
LAW, JT .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (10) :1563-1571
[3]   MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY [J].
ARCHER, RJ ;
GOBELI, GW .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1965, 26 (02) :343-&
[4]   ESTIMATES OF EFFICIENCIES OF PRODUCTION AND DETECTION OF ELECTRON-EXCITED AUGER EMISSION [J].
BISHOP, HE ;
RIVIERE, JC .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (04) :1740-&
[5]   AUGER SPECTROSCOPY OF SILICON [J].
BISHOP, HE ;
RIVIERE, JC ;
TAYLOR, NJ .
SURFACE SCIENCE, 1969, 17 (02) :462-&
[6]   OXYGEN STICKING COEFFICIENTS ON CLEAN (111) SILICON SURFACES [J].
CAROSELLA, CA ;
COMAS, J .
SURFACE SCIENCE, 1969, 15 (02) :303-+
[7]   CARBON CONTAMINATION OF SI(111) SURFACES [J].
CHARIG, JM ;
SKINNER, DK .
SURFACE SCIENCE, 1969, 15 (02) :277-&
[8]   SOME SURFACE PROPERTIES OF SILICON-CARBIDE CRYSTALS [J].
DILLON, JA ;
SCHLIER, RE ;
FARNSWORTH, HE .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (05) :675-679
[9]   ADSORPTION OF OXYGEN ON SILICON [J].
EISINGER, J ;
LAW, JT .
JOURNAL OF CHEMICAL PHYSICS, 1959, 30 (02) :410-412
[10]   THE ADSORPTION OF OXYGEN ON CLEAN SILICON SURFACES [J].
GREEN, M ;
MAXWELL, KH .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 13 (1-2) :145-150