STRUCTURAL CHARACTERIZATION OF BORON-NITRIDE FILMS

被引：15

作者：

DUNCAN, TM

LEVY, RA

GALLAGHER, PK

WALSH, MW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 06期

关键词：

D O I：

10.1063/1.342471

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2990 / 2994

页数：5

共 11 条

[1]

ABRAGAM A, 1961, PRINCIPLES NUCL MAGN, P00378

[2] MULTIPLE-QUANTUM NMR-STUDY OF CLUSTERING IN HYDROGENATED AMORPHOUS-SILICON [J].

BAUM, J ;

GLEASON, KK ;

PINES, A ;

GARROWAY, AN ;

REIMER, JA .

PHYSICAL REVIEW LETTERS, 1986, 56 (13) :1377-1380

[3] ORIENTATIONAL ORDERING AND MELTING OF MOLECULAR H-2 IN AN A-SI MATRIX - NMR-STUDIES [J].

BOYCE, JB ;

STUTZMANN, M .

PHYSICAL REVIEW LETTERS, 1985, 54 (06) :562-565

[4] TEMPERATURE CALIBRATION OF A MASS SPECTROGRAPHIC EVOLVED GAS-ANALYSIS SYSTEM [J].

GALLAGHER, PK .

THERMOCHIMICA ACTA, 1984, 82 (02) :325-334

[5] RADIATION-DAMAGE EFFECTS IN BORON-NITRIDE MASK MEMBRANES SUBJECTED TO X-RAY-EXPOSURES [J].

JOHNSON, WA ;

LEVY, RA ;

RESNICK, DJ ;

SAUNDERS, TE ;

YANOF, AW ;

BETZ, H ;

HUBER, H ;

OERTEL, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :257-261

[6]

LEOPOLD DJ, 1984, J NONCRYST SOLIDS, V66, P2285

[7] AN IMPROVED BORON-NITRIDE TECHNOLOGY FOR SYNCHROTRON X-RAY MASKS [J].

LEVY, RA ;

RESNICK, DJ ;

FRYE, RC ;

YANOF, AW ;

WELLS, GM ;

CERRINA, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :154-161

[8]

Mehring M., 1983, PRINCIPLES HIGH RESO

[9] PROTON-MAGNETIC-RESONANCE STUDIES OF MICROSTRUCTURE IN PLASMA-DEPOSITED AMORPHOUS-SILICON-HYDROGEN FILMS [J].

REIMER, JA ;

VAUGHAN, RW ;

KNIGHTS, JC .

PHYSICAL REVIEW B, 1981, 24 (06) :3360-3370

[10] LOCAL BONDING CONFIGURATION OF PHOSPHORUS IN DOPED AND COMPENSATED AMORPHOUS HYDROGENATED SILICON [J].

REIMER, JA ;

DUNCAN, TM .

PHYSICAL REVIEW B, 1983, 27 (08) :4895-4901

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