THE USE OF RAMAN-SCATTERING TO STUDY DISORDER IN PULSED-LASER DEPOSITED MOS2 FILMS

被引:44
作者
MCDEVITT, NT [1 ]
ZABINSKI, JS [1 ]
DONLEY, MS [1 ]
机构
[1] WL,MLBT,MAT DIRECTORATE,WRIGHT PATTERSON AFB,OH 45431
关键词
D O I
10.1016/0040-6090(94)90698-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Raman scattering is utililized to investigate structural - disorder in solid lubricant films. MoS2 films used in tribological studies for aerospace applications may be prepared by pulsed laser deposition (PLD) or by ion sputter deposition. Raman scattering spectra were obtained on a set of standard MoS, compounds and a set of PLD films. These deposition processes incorporate changes into the crystallinity of the deposited films and the Raman data from these films were studied with a curve fitting program to analyze-the defects generated by the PLD process. The curve fitting program shows that MoS2 PLD films can be categorized by peak position, half-band width, integrated area and linear intensity measurements. The Raman data appear to be more sensitive to crystal order in the x-y symmetry plane than to order in the z axis of the crystal.
引用
收藏
页码:76 / 81
页数:6
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