IMPROVED TRIBOLOGICAL PROPERTIES OF SPUTTERED MOSX FILMS BY ION-BEAM MIXING

被引：28

作者：

KOBS, K

DIMIGEN, H

HUBSCH, H

TOLLE, HJ

LEUTENECKER, R

RYSSEL, H

机构：

[1] FRAUNHOFER INST FESTKORPERTECHNOL,D-8000 MUNCHEN 60,FED REP GER

[2] FHG ARBEITSGRP INTEGRIERTE SCHALTUNGEN,D-8520 ERLANGEN,FED REP GER

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 09期

关键词：

D O I：

10.1063/1.97129

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：496 / 498

页数：3

共 9 条

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[6]

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[7] MORPHOLOGICAL AND FRICTIONAL BEHAVIOR OF SPUTTERED MOS2 FILMS [J].

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[8] FRICTIONAL AND MORPHOLOGICAL PROPERTIES OF AU-MOS2 FILMS SPUTTERED FROM A COMPACT TARGET [J].

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THIN SOLID FILMS, 1984, 118 (03) :375-384

[9] TRIBOLOGICAL PROPERTIES OF SPUTTERED MOS2 FILMS IN RELATION TO FILM MORPHOLOGY [J].

SPALVINS, T .

THIN SOLID FILMS, 1980, 73 (02) :291-297

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