THE THERMAL-STABILITY OF LASER-PRODUCED SILICIDE LAYERS

被引：5

作者：

WITTMER, M ^{[1
]}

LUTHY, W ^{[1
]}

VONALLMEN, M ^{[1
]}

机构：

[1] UNIV BERN, INST APPL PHYS, CH-3012 BERN, SWITZERLAND

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 10期

关键词：

D O I：

10.1063/1.327455

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5386 / 5389

页数：4

共 32 条

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