ION-BEAM-INDUCED FORMATION OF THE PDSI SILICIDE

被引:47
作者
TSAUR, BY
LAU, SS
MAYER, JW
机构
[1] California Institute of Technology, Pasadena
关键词
D O I
10.1063/1.91103
中图分类号
O59 [应用物理学];
学科分类号
摘要
Formation of PdSi has been obtained by implanting energetic Xe ions through a thin Pd (or Pd2Si) film on a Si substrate. The PdSi phase was found to form near the Pd2Si-Si interface from Rutherford backscattering measurements. Phase formation was confirmed by glancing-angle x-ray-diffraction analysis. Subsequent thermal annealing at 300-400°C resulted in successive growth of the phase. A uniform PdSi layer was obtained at the final stage of the annealing and exhibited a sheet resistivity of 18 μΩ cm.
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页码:225 / 227
页数:3
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