THIN PT AND PD SILICIDE SCHOTTKY BARRIERS FOR SILICON SOLAR-CELLS

被引:15
作者
CANALI, C [1 ]
CATELLANI, F [1 ]
MANTOVANI, S [1 ]
PRUDENZIATI, M [1 ]
机构
[1] UNIV MODENA,IST FIS,I-41100 MODENA,ITALY
关键词
D O I
10.1088/0022-3727/10/18/013
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2481 / 2489
页数:9
相关论文
共 15 条
[1]   PLANAR MESA SCHOTTKY BARRIER DIODE [J].
ANANTHA, NG ;
ASHAR, KG .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1971, 15 (06) :442-+
[2]   REVERSE CURRENT-VOLTAGE CHARACTERISTICS OF METAL-SILICIDE SCHOTTKY DIODES [J].
ANDREWS, JM ;
LEPSELTER, MP .
SOLID-STATE ELECTRONICS, 1970, 13 (07) :1011-+
[3]   ROLE OF METAL-SEMICONDUCTOR INTERFACE IN SILICON INTEGRATED-CIRCUIT TECHNOLOGY [J].
ANDREWS, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (06) :972-984
[4]  
BOWER RW, 1973, SOLID ST ELECTRON, V16, P14
[5]   ALUMINUM-SILICON SCHOTTKY BARRIERS AND OHMIC CONTACTS IN INTEGRATED-CIRCUITS [J].
CARD, HC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1976, 23 (06) :538-544
[6]   PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS [J].
CHU, WK ;
MAYER, JW ;
NICOLET, MA ;
BUCK, TM ;
AMSEL, G ;
EISEN, F .
THIN SOLID FILMS, 1973, 17 (01) :1-41
[7]   ELECTRICAL AND MECHANICAL FEATURES OF PLATINUM SILICIDE-ALUMINUM REACTION [J].
HOSACK, HH .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (08) :3476-3485
[8]  
HOVEL AJ, 1975, SEMICONDUCTORS SEMIM, V11
[10]   ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J].
MAYER, JW ;
TU, KN .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :86-93