NUCLEATION CONSIDERATIONS IN THE WAVELENGTH-DEPENDENT ACTIVATION SELECTIVITY OF ALUMINUM CHEMICAL-VAPOR DEPOSITION

被引：13

作者：

HIGASHI, GS

BLONDER, GE

FLEMING, CG

MCCRARY, VR

DONNELLY, VM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.583838

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1441 / 1443

页数：3

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