PATTERNED ALUMINUM GROWTH VIA EXCIMER LASER ACTIVATED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：48

作者：

HIGASHI, GS

FLEMING, CG

机构：

来源：

关键词：

D O I：

10.1063/1.96593

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1051 / 1053

页数：3

共 9 条

[1] BLONDER GE, UNPUB
[2] COOKE MJ, 1982, SOLID STATE TECHNOL, V25, P62
[3] OHMIC CONTACT FORMATION ON INP BY PULSED LASER PHOTOCHEMICAL DOPING
DEUTSCH, TF
EHRLICH, DJ
OSGOOD, RM
LIAU, ZL
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (10) : 847 - 849
[4] EFFICIENT GAAS SOLAR-CELLS FORMED BY UV LASER CHEMICAL DOPING
DEUTSCH, TF
FAN, JCC
EHRLICH, DJ
TURNER, GW
CHAPMAN, RL
GALE, RP
[J]. APPLIED PHYSICS LETTERS, 1982, 40 (08) : 722 - 724
[5] ALUMINUM FILMS PREPARED BY METAL ORGANIC LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
GREEN, ML
LEVY, RA
NUZZO, RG
COLEMAN, E
[J]. THIN SOLID FILMS, 1984, 114 (04) : 367 - 377
[6] SURFACE PHOTOCHEMICAL PHENOMENA IN LASER CHEMICAL VAPOR-DEPOSITION
HIGASHI, GS
ROTHBERG, LJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (05): : 1460 - 1463
[7] INVESTIGATION OF THE SURFACE PHOTOCHEMICAL BASIS FOR METAL-FILM NUCLEATION IN LASER CHEMICAL VAPOR-DEPOSITION
HIGASHI, GS
ROTHBERG, LJ
[J]. APPLIED PHYSICS LETTERS, 1985, 47 (12) : 1288 - 1290
[8] SCHLYER DJ, 1976, J ORGANOMET CHEM, V114, P9
[9] TSAO JY, 1984, APPL PHYS LETT, V245, P617