SEM AND TEM STUDIES OF DEFECTS IN SI-DOPED GAAS SUBSTRATE MATERIAL BEFORE AND AFTER ZN DIFFUSION

被引:9
作者
DARBY, DB [1 ]
AUGUSTUS, PD [1 ]
BOOKER, GR [1 ]
STIRLAND, DJ [1 ]
机构
[1] PLESSEY CO LTD,ALLEN CLARK RES CTR,TOWCHESTER NN12 8EQ,NORTHAMPTONSHIR,ENGLAND
来源
JOURNAL OF MICROSCOPY-OXFORD | 1980年 / 118卷 / MAR期
关键词
D O I
10.1111/j.1365-2818.1980.tb00283.x
中图分类号
TH742 [显微镜];
学科分类号
摘要
引用
收藏
页码:343 / 349
页数:7
相关论文
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