THERMOELECTRIC-POWER, HALL-COEFFICIENT, AND STRUCTURE PROPERTIES OF TA THIN-FILMS RF SPUTTERED IN AR-N2-O2

被引：5

作者：

PERINATI, A ^{[1
]}

PIACENTINI, GF ^{[1
]}

机构：

[1] TELETTRA SPA,I-20059 VIMERCATE,ITALY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569114

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：169 / 173

页数：5

共 11 条

[1] RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERE [J].

BAKER, PN .

THIN SOLID FILMS, 1970, 6 (05) :R57-&

[2] STRUCTURE AND ELECTRICAL PROPERTIES OF TA FILMS SPUTTERED IN AR-O2 [J].

FEINSTEIN, LG ;

GERSTENBERG, D .

THIN SOLID FILMS, 1972, 10 (01) :79-+

[3] REACTIVELY SPUTTERED TANTALUM THIN FILM RESISTORS .1. PHYSICAL AND ELECTRICAL PROPERTIES [J].

HARDY, WR ;

SHEWCHUN, J ;

KUENZIG, D ;

TAM, C .

THIN SOLID FILMS, 1971, 8 (02) :81-&

[4]

MATHIEU F, 1975, ONDE ELECTRIQUE, V55, P553

[5]

PARISI GI, 1969, 19TH P EL COMP C, P367

[6]

PIACENTINI GF, 1976, 2ND INT C SPUTT APPL

[7] RF SPUTTERED BETA-TANTALUM AND BCC TANTALUM FILMS [J].

SCHAUER, A ;

ROSCHY, M .

THIN SOLID FILMS, 1972, 12 (02) :313-&

[8] STRUCTURE AND PROPERTIES OF RF SPUTTERED, SUPERCONDUCTING TANTALUM FILMS [J].

SCHREY, F ;

MATHIS, RD ;

PAYNE, RT ;

MURR, LE .

THIN SOLID FILMS, 1970, 5 (01) :29-&

[9] DEFECT STRUCTURE OF TA2O5 [J].

STROUD, JE ;

TRIPP, WC ;

WIMMER, JM .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1974, 57 (04) :172-175

[10]

TRUDEL NL, 1972, 22ND P EL COMP C, P431

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