SHORT-WAVELENGTH ANNULAR-FIELD OPTICAL-SYSTEM FOR IMAGING 10TH-MICRON FEATURES

被引:15
作者
WOOD, OR [1 ]
SILFVAST, WT [1 ]
JEWELL, TE [1 ]
机构
[1] AT&T BELL LABS,MURRAY HILL,NJ 07974
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期
关键词
D O I
10.1116/1.584500
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1613 / 1615
页数:3
相关论文
共 7 条
  • [1] SILICON-CARBIDE DIFFRACTION GRATING FOR VACUUM UV - FEASIBILITY
    CHOYKE, WJ
    PARTLOW, WD
    SUPERTZI, EP
    VENSKYTIS, FJ
    BRANDT, GB
    [J]. APPLIED OPTICS, 1977, 16 (08): : 2013 - 2014
  • [2] FEDER R, 1984, XRAY MICROSCOPY, P279
  • [3] Hunter W. R., 1973, Electro-Optical Systems Design, V5, P16
  • [4] NEW CONCEPTS IN PROJECTION MASK ALIGNERS
    OFFNER, A
    [J]. OPTICAL ENGINEERING, 1975, 14 (02) : 130 - 132
  • [5] SAMSON JA, 1967, TECHNOLOGIES VACUUM, P38
  • [6] Tenth micron lithography with a 10 Hz 37-2 nm sodium
    Silvast, W.T.
    Wood II, O.R.
    [J]. Microelectronic Engineering, 1988, 8 (1-2) : 3 - 11
  • [7] MEASUREMENT OF SOFT-X-RAY MULTILAYER MIRROR REFLECTANCE AT NORMAL INCIDENCE USING LASER-PRODUCED PLASMAS
    TRAIL, JA
    BYER, RL
    BARBEE, TW
    [J]. APPLIED PHYSICS LETTERS, 1988, 52 (04) : 269 - 271