ION RANGE AND DAMAGE DEPTH PARAMETERS FOR 20-200 KEVPB+ ION-IMPLANTATION IN SI

被引:9
作者
CHRISTODOULIDES, CE [1 ]
KADHIM, NJ [1 ]
CARTER, G [1 ]
JIMENEZRODRIGUEZ, JJ [1 ]
GRASMARTI, A [1 ]
机构
[1] UNIV SALFORD,DEPT ELECT ENGN,SALFORD M5 4WT,LANCASHIRE,ENGLAND
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1981年 / 191卷 / 1-3期
关键词
D O I
10.1016/0029-554X(81)90994-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:124 / 134
页数:11
相关论文
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