FILM DEPOSITION TEMPERATURE-DEPENDENCE OF ELECTRON-MOBILITY FOR ACCUMULATION-MODE INP METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS

被引:15
作者
HIROTA, Y [1 ]
OKAMURA, M [1 ]
YAMAGUCHI, E [1 ]
HISAKI, T [1 ]
机构
[1] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, APPL ELECTR LABS, MUSASHINO, TOKYO 180, JAPAN
关键词
D O I
10.1063/1.343029
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1328 / 1337
页数:10
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