PHYSICAL-PROPERTIES OF SIO2 AND ITS INTERFACE TO SILICON IN MICROELECTRONIC APPLICATIONS

被引：3

作者：

WEBER, W ^{[1
]}

BROX, M ^{[1
]}

机构：

[1] IBM CORP,IBM SIEMENS DRAM DEV PROJECT,ESSEX JCT,VT

来源：

MRS BULLETIN | 1993年 / 18卷 / 12期

关键词：

D O I：

10.1557/S0883769400039063

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：36 / 42

页数：7

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