A COMPUTER MODELING STUDY OF HIGH-RESOLUTION ELECTRON-MICROSCOPE IMAGES OF AMORPHOUS-TO-CRYSTALLINE TRANSITION BOUNDARIES

被引:6
作者
KRAKOW, W [1 ]
机构
[1] XEROX CORP,ROCHESTER,NY 14644
关键词
D O I
10.1016/0304-3991(80)90023-6
中图分类号
TH742 [显微镜];
学科分类号
摘要
引用
收藏
页码:175 / 194
页数:20
相关论文
共 24 条
[1]   CROSS-SECTIONAL SPECIMENS FOR TRANSMISSION ELECTRON-MICROSCOPY [J].
ABRAHAMS, MS ;
BUIOCCHI, CJ .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) :3315-3316
[2]   SI-SIO2 INTERFACE EXAMINED BY CROSS-SECTIONAL TRANSMISSION ELECTRON-MICROSCOPY [J].
BLANC, J ;
BUIOCCHI, CJ ;
ABRAHAMS, MS ;
HAM, WE .
APPLIED PHYSICS LETTERS, 1977, 30 (02) :120-122
[3]  
GASKELL PH, 1974, 12TH P INT C PHYS SE, P1076
[4]  
HAASE J, 1970, Z NATURFORSCH PT A, VA 25, P936
[5]   LOW-ENERGY ION-SCATTERING SPECTROMETRY (ISS) OF SIO2-SI INTERFACE [J].
HARRINGTON, WL ;
HONIG, RE ;
GOODMAN, AM ;
WILLIAMS, R .
APPLIED PHYSICS LETTERS, 1975, 27 (12) :644-645
[6]  
HASHIMOTO H, 1978, 9TH P INT C EL MICR, V1, P284
[7]   OBSERVATION OF AN INTERMEDIATE CHEMICAL STATE OF SILICON IN SI-SIO2 INTERFACE BY AUGER SPUTTER PROFILING [J].
HELMS, CR ;
STRAUSSER, YE ;
SPICER, WE .
APPLIED PHYSICS LETTERS, 1978, 33 (08) :767-769
[8]   NEW STUDIES OF SI-SIO2 INTERFACE USING AUGER SPUTTER PROFILING [J].
HELMS, CR ;
SPICER, WE ;
JOHNSON, NM .
SOLID STATE COMMUNICATIONS, 1978, 25 (09) :673-676
[9]   QUESTION OF MICROCRYSTALLITES IN SOME AMORPHOUS MATERIALS - ELECTRON-MICROSCOPE INVESTIGATION [J].
HERD, SR ;
CHAUDHARI, P .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1974, 26 (02) :627-642
[10]  
HORIUCHI S, 1978, J ELECTRON MICROSC, V27, P39