DEEP LEVELS IN UNDOPED IN0.5GA0.5P AND IN0.5GA0.5P0.99AS0.01 GROWN ON GAAS (100) SUBSTRATES

被引:10
作者
LAN, S
YANG, CQ
CUI, DL
XU, WJ
LIU, HD
机构
[1] Department of Physics, National Laboratory of Mesoscopic Physics, Peking University
关键词
D O I
10.1063/1.113415
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-quality In0.5Ga0.5P and In0.5Ga0.5P0.99As0.01 epitaxial layers on the GaAs (100) substrate have been grown by liquid phase epitaxy (LPE). Special attention is paid to the deep level transient spectroscopy (DLTS) and transient photoresponse in these samples. It is found that the epitaxial layers grown under the optimum P vapor pressure are free from deep levels and show a much longer photocarrier lifetime. We suggest that the deep level may be attributed to interstitial P atoms. From the photocarrier lifetime of different samples, we can conclude that the interstitial P atoms act as recombination centers.© 1995 American Institute of Physics.
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页码:872 / 874
页数:3
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