LOW-TEMPERATURE PLASMA OXIDATION OF GAAS

被引：43

作者：

YOKOYAMA, N

MIMURA, T

ODANI, K

FUKUTA, M

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 01期

关键词：

D O I：

10.1063/1.89839

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：58 / 60

页数：3

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