ERROR REDUCTION IN MONODIRECTIONAL ION MILLING

被引：4

作者：

CARTER, G ^{[1
]}

NOBES, MJ ^{[1
]}

KATARDJIEV, IV ^{[1
]}

机构：

[1] BULGARIAN ACAD SCI,INST ELECTR,BU-1113 SOFIA,BULGARIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.577183

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

When ion milling is employed to change the contours of large area surfaces it is often assumed that the sputtering rate is directly proportional to the sputtering yield for normal ion incidence on to a plane surface. It is shown how this zero order approximation can lead to errors in expected contours and higher order approximations are analyzed to indicate how errors can be reduced by improved choice of sputtering parameters. The behavior of static, broad beam, and dynamic, swept focused beam systems are discussed.

引用

页码：3126 / 3133

页数：8

共 35 条

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