STRUCTURAL STUDIES OF THE CRYSTAL SOLUTION INTERFACE USING SYNCHROTRON RADIATION

被引:14
作者
CUNNINGHAM, D [1 ]
DAVEY, RJ [1 ]
ROBERTS, KJ [1 ]
SHERWOOD, JN [1 ]
SHRIPATHI, T [1 ]
机构
[1] SERC, DARESBURY LAB, WARRINGTON WA4 4AD, CHESHIRE, ENGLAND
关键词
D O I
10.1016/S0022-0248(08)80082-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A novel in-situ system for the investigation of the structural nature of the crystal/solution interface is presented. A combination of synchrotron radiation and high resolution X-ray diffraction enables the growth interface to be studied under a thick overlayer of saturated solution. Data on the growth and dissolution of the (100) crystal surface of ADP under 6 mm of thick saturated solution is presented which indicates the existence of an ordered layer at the crystal/solution interface. Kinetic studies reveal this interfacial layer to be highly labile. © 1990, Elsevier Science Publishers B.V.. All rights reserved.
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页码:1065 / 1069
页数:5
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