VERIFICATION OF A PROXIMITY EFFECT CORRECTION PROGRAM IN ELECTRON-BEAM LITHOGRAPHY

被引：25

作者：

KRATSCHMER, E

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

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D O I：

10.1116/1.571257

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1264 / 1268

页数：5

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