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VERIFICATION OF A PROXIMITY EFFECT CORRECTION PROGRAM IN ELECTRON-BEAM LITHOGRAPHY
被引:25
作者
:
KRATSCHMER, E
论文数:
0
引用数:
0
h-index:
0
KRATSCHMER, E
机构
:
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1981年
/ 19卷
/ 04期
关键词
:
D O I
:
10.1116/1.571257
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1264 / 1268
页数:5
相关论文
共 7 条
[1]
PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
CHANG, THP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
CHANG, THP
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1975,
12
(06):
: 1271
-
1275
[2]
PROXIMITY CORRECTION ENHANCEMENTS FOR 1-MUM DENSE CIRCUITS
GROBMAN, WD
论文数:
0
引用数:
0
h-index:
0
GROBMAN, WD
SPETH, AJ
论文数:
0
引用数:
0
h-index:
0
SPETH, AJ
CHANG, THP
论文数:
0
引用数:
0
h-index:
0
CHANG, THP
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1980,
24
(05)
: 537
-
544
[3]
PATTERN PARTITIONING FOR ENHANCED PROXIMITY-EFFECT CORRECTIONS IN ELECTRON-BEAM LITHOGRAPHY
PARIKH, M
论文数:
0
引用数:
0
h-index:
0
PARIKH, M
SCHREIBER, DE
论文数:
0
引用数:
0
h-index:
0
SCHREIBER, DE
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1980,
24
(05)
: 530
-
536
[4]
ENERGY DEPOSITION FUNCTIONS IN ELECTRON RESIST FILMS ON SUBSTRATES
PARIKH, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
PARIKH, M
KYSER, DF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
KYSER, DF
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(02)
: 1104
-
1111
[5]
CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY
PARIKH, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
PARIKH, M
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(06)
: 4371
-
4377
[6]
PHANG JCH, 1979, 1979 P MICR ENG AACH, P219
[7]
ADVANCED ELECTRON-BEAM LITHOGRAPHY - SOFTWARE SYSTEM AMDES
SUGIYAMA, N
论文数:
0
引用数:
0
h-index:
0
SUGIYAMA, N
SAITOH, K
论文数:
0
引用数:
0
h-index:
0
SAITOH, K
SHIMIZU, K
论文数:
0
引用数:
0
h-index:
0
SHIMIZU, K
TARUI, Y
论文数:
0
引用数:
0
h-index:
0
TARUI, Y
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(08)
: 1466
-
1474
←
1
→
共 7 条
[1]
PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
CHANG, THP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
CHANG, THP
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1975,
12
(06):
: 1271
-
1275
[2]
PROXIMITY CORRECTION ENHANCEMENTS FOR 1-MUM DENSE CIRCUITS
GROBMAN, WD
论文数:
0
引用数:
0
h-index:
0
GROBMAN, WD
SPETH, AJ
论文数:
0
引用数:
0
h-index:
0
SPETH, AJ
CHANG, THP
论文数:
0
引用数:
0
h-index:
0
CHANG, THP
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1980,
24
(05)
: 537
-
544
[3]
PATTERN PARTITIONING FOR ENHANCED PROXIMITY-EFFECT CORRECTIONS IN ELECTRON-BEAM LITHOGRAPHY
PARIKH, M
论文数:
0
引用数:
0
h-index:
0
PARIKH, M
SCHREIBER, DE
论文数:
0
引用数:
0
h-index:
0
SCHREIBER, DE
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1980,
24
(05)
: 530
-
536
[4]
ENERGY DEPOSITION FUNCTIONS IN ELECTRON RESIST FILMS ON SUBSTRATES
PARIKH, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
PARIKH, M
KYSER, DF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
KYSER, DF
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(02)
: 1104
-
1111
[5]
CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY
PARIKH, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
PARIKH, M
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(06)
: 4371
-
4377
[6]
PHANG JCH, 1979, 1979 P MICR ENG AACH, P219
[7]
ADVANCED ELECTRON-BEAM LITHOGRAPHY - SOFTWARE SYSTEM AMDES
SUGIYAMA, N
论文数:
0
引用数:
0
h-index:
0
SUGIYAMA, N
SAITOH, K
论文数:
0
引用数:
0
h-index:
0
SAITOH, K
SHIMIZU, K
论文数:
0
引用数:
0
h-index:
0
SHIMIZU, K
TARUI, Y
论文数:
0
引用数:
0
h-index:
0
TARUI, Y
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(08)
: 1466
-
1474
←
1
→