EVALUATION OF LB FILMS AS QUARTER MICRON LITHOGRAPHY RESISTS USING EXCIMER LASER, X-RAY, AND ELECTRON-BEAM EXPOSURE

被引：11

作者：

OGAWA, K

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 05期

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D O I：

10.1143/JJAP.27.855

中图分类号：

O59 [应用物理学];

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页码：855 / 860

页数：6

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