POTENTIAL BARRIERS TO ELECTRON TUNNELLING IN ULTRATHIN FILMS OF SIO2

被引：51

作者：

CARD, HC ^{[1
]}

机构：

[1] UNIV MANCHESTER,INST SCI & TECHNOL,DEPT ELECT ENGN & ELECTR,SACKVILLE ST,MANCHESTER 1,ENGLAND

来源：

SOLID STATE COMMUNICATIONS | 1974年 / 14卷 / 10期

关键词：

D O I：

10.1016/0038-1098(74)90414-1

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

收藏

页码：1011 / 1014

页数：4

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