THEORETICAL-ANALYSIS OF A-SI-H BASED MULTILAYER STRUCTURE THIN-FILM TRANSISTORS

被引:3
作者
REITA, C
MARIUCCI, L
FORTUNATO, G
机构
[1] Istituto di Elettronica dello Stato Solido, CNR, Roma, 00156
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 09期
关键词
Field-effect; Field-effect conductance; Hydrogenated amorphous silicon (a-Si:H); Mobility; Multilayer structure; Thin-film transistor;
D O I
10.1143/JJAP.29.1634
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper we show that the experimentally observed increase in the field-effect mobility in superlattice TFTs can be accounted for by a simple classical model based on Poisson's equation, including the presence of interface states at every interface. The field-effect mobility enhancement is a direct consequence of the different potential and electric field distibutions among the various layers, if compared with a single layer structure with the same total active layer thickness. The results of the calculations fit well experimental data already reported. Furthermore, the analysis of the single layer structure shows a similar field-effect mobility enhancement, suggesting the reduction of the active layer thickness as a key factor. © 1990 The Japan Society of Applied Physics.
引用
收藏
页码:1634 / 1638
页数:5
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