PRODUCTION OF HIGH-QUALITY AMORPHOUS-SILICON FILMS BY EVAPORATIVE SILANE SURFACE DECOMPOSITION

被引：169

作者：

DOYLE, J ^{[1
]}

ROBERTSON, R ^{[1
]}

LIN, GH ^{[1
]}

HE, MZ ^{[1
]}

GALLAGHER, A ^{[1
]}

机构：

[1] NBS,BOULDER,CO 80309

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 06期

关键词：

D O I：

10.1063/1.341539

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3215 / 3223

页数：9

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