KINETICS OF SILICON DEPOSITION ON SILICON BY PYROLYSIS OF SILANE - MASS-SPECTROMETRIC INVESTIGATION BY MOLECULAR-BEAM SAMPLING

被引：162

作者：

FARROW, RFC ^{[1
]}

机构：

[1] MINIST DEF,ROY RADAR ESTAB,MALVERN,WORCESTERSHIRE,ENGLAND

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 07期

关键词：

D O I：

10.1149/1.2401950

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：899 / 907

页数：9

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