DISSOCIATIVE DIFFUSION OF GOLD IN SILICON

被引：41

作者：

YOSHIDA, M

SAITO, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1970年 / 9卷 / 10期

关键词：

D O I：

10.1143/JJAP.9.1217

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1217 / &

共 18 条

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