FAVORABLE SOURCE MATERIAL IN LIQUID-METAL-ION SOURCES FOR FOCUSED BEAM APPLICATIONS

被引：22

作者：

ISHITANI, T

UMEMURA, K

KAWANAMI, Y

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.584326

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：931 / 935

页数：5

共 31 条

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