COMPARISON OF THE ETCHING AND PLASMA CHARACTERISTICS OF DISCHARGES IN CF4 AND NF3

被引：45

作者：

IANNO, NJ

GREENBERG, KE

VERDEYEN, JT

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 10期

关键词：

D O I：

10.1149/1.2127212

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2174 / 2179

页数：6

共 24 条

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