共 27 条
[1]
ATHAVALE S, 1990, VACUUM, V41, P876
[3]
MAGNETIC-FIELD AND SUBSTRATE POSITION EFFECTS ON THE ION DEPOSITION FLUX RATIO IN MAGNETRON SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1991, 9 (03)
:1166-1170
[7]
Golant V. E., 1977, FUNDAMENTALS PLASMA
[8]
GREENE JE, 1990, PLASMA SURFACE INTER
[10]
KAGAN YM, 1969, SOV PHYS TECH PHYS-U, V13, P1348