INCIDENT ION ENERGY-SPECTRUM AND TARGET SPUTTERING RATE IN DC PLANAR MAGNETRON

被引：13

作者：

CZEKAJ, D

GORANCHEV, B

HOLLMANN, EK

VOLPYAS, VA

ZAYTSEV, AG

机构：

[1] BULGARIAN ACAD SCI,INST ELECTR,BU-1784 SOFIA,BULGARIA

[2] VI ULYANOV LENIN ELECT ENGN INST,LENINGRAD 1970022,USSR

来源：

VACUUM | 1991年 / 42卷 / 1-2期

关键词：

D O I：

10.1016/0042-207X(91)90075-T

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A model which permits the calculation of the energy spectrum of the ions striking the cathode of a dc planar magnetron and, thus, the prediction of the cathode sputtering rate is discussed. The theoretical description is based on the consideration of the ionization process taking place in the discharge cathode sheath in terms of mobility theory. The predicted ion energy distributions and target sputtering rates are in good agreement with those measured. © 1990.

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页码：43 / 45

页数：3

相关论文

共 11 条

[1]

Andersen H.H, 1981, SPUTTERING PARTICLE

[2] AN ANALYTICAL FORMULA AND IMPORTANT PARAMETERS FOR LOW-ENERGY ION SPUTTERING [J].

BOHDANSKY, J ;

ROTH, J ;

BAY, HL .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) :2861-2865

[3] ION ENERGIES AT THE CATHODE OF THE DC PLANAR MAGNETRON SPUTTERING DISCHARGE [J].

CZEKAJ, D ;

HOLLMANN, EK ;

KOZIREV, AB ;

VOLPYAS, VA ;

ZAYTSEV, AG .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 49 (03) :269-272

[4] ELECTRIC-POTENTIAL DISTRIBUTION EFFECTS IN DC DIODE SPUTTERING DISCHARGES [J].

CZEKAJ, D ;

HOLLMANN, EK ;

KOZIREV, AB ;

VOLPYAS, VA ;

ZAYTSEV, AG .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 36 (03) :316-318

[5] CATHODE ETCHING RATE IN ABNORMAL GLOW-DISCHARGES [J].

CZEKAJ, D ;

HOLLMANN, EK ;

KOZIREV, AB ;

VOLPIAS, VA ;

ZAYTSEV, AG .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 48 (06) :573-574

[6] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES [J].

MANIV, S ;

WESTWOOD, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03) :743-751

[7] GENERALIZATION OF THE MODEL FOR THE J-V CHARACTERISTICS OF DC SPUTTERING DISCHARGES [J].

MANIV, S .

JOURNAL OF APPLIED PHYSICS, 1986, 59 (01) :66-70

[8] MAGNETRON SPUTTERING - BASIC PHYSICS AND APPLICATION TO CYLINDRICAL MAGNETRONS [J].

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :171-177

[9] EVOLUTION TOWARDS THERMALIZATION, AND DIFFUSION, OF SPUTTERED PARTICLE FLUXES - SPATIAL PROFILES [J].

VALLESABARCA, JA ;

GRASMARTI, A .

JOURNAL OF APPLIED PHYSICS, 1984, 55 (05) :1370-1378

[10] SPUTTERING IN A CROSSED ELECTROMAGNETIC FIELD [J].

WASA, K ;

HAYAKAWA, S .

IEEE TRANSACTIONS ON PARTS MATERIALS AND PACKAGING, 1967, PMP3 (03) :71-&