ION ENERGIES AT THE CATHODE OF THE DC PLANAR MAGNETRON SPUTTERING DISCHARGE

被引：4

作者：

CZEKAJ, D ^{[1
]}

HOLLMANN, EK ^{[1
]}

KOZIREV, AB ^{[1
]}

VOLPYAS, VA ^{[1
]}

ZAYTSEV, AG ^{[1
]}

机构：

[1] VI ULYANOV LENIN ELECT ENGN INST,SU-197022 LENINGRAD,USSR

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 49卷 / 03期

关键词：

D O I：

10.1007/BF00616853

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：269 / 272

页数：4

共 8 条

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[3]

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[5]

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THORNTON, JA .

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[7] PLANAR MAGNETRON SPUTTERING [J].

WAITS, RK .

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[8] THE CURRENT-VOLTAGE CHARACTERISTIC OF MAGNETRON SPUTTERING SYSTEMS [J].

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