SPIN COATING OVER TOPOGRAPHY

被引：60

作者：

PEURRUNG, LM ^{[1
]}

GRAVES, DB ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720

来源：

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 1993年 / 6卷 / 01期

关键词：

D O I：

10.1109/66.210660

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present a model for predicting film thickness profiles around topographical features during spin coating. This model is applicable to features of arbitrary geometry in the two lateral dimensions. This generality permits study of the planarization of real device structures, including both isolated and neighboring features, with any orientation with respect to the wafer center. Predictions from this model agree qualitatively with measured film profiles from interferograms taken during spinning. Phenomena such as ''pile-up'' and ''wakes'' result from interactions between surface tension and other driving forces in the flow.

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页码：72 / 76

页数：5

相关论文

共 20 条

[1] ALIGNMENT ERRORS FROM RESIST COATING TOPOGRAPHY [J].

BOBROFF, N ;

ROSENBLUTH, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :403-408

[2]

BORNSIDE DE, 1987, J IMAGING TECHNOL, V13, P122

[3] MECHANISM FOR THE LOCAL PLANARIZATION OF MICROSCOPICALLY ROUGH SURFACES BY DRYING THIN-FILMS OF SPIN-COATED POLYMER SOLVENT SOLUTIONS [J].

BORNSIDE, DE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (08) :2589-2595

[4] A PLANARIZATION TECHNOLOGY USING A BIAS-DEPOSITED DIELECTRIC FILM AND AN ETCH-BACK PROCESS [J].

FUJII, S ;

FUKUMOTO, M ;

FUSE, G ;

OHZONE, T .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (11) :1829-1833

[5] ON THE FLOW OF A THIN LIQUID-FILM OVER A ROUGH ROTATING-DISK [J].

HWANG, JH ;

MA, F .

JOURNAL OF APPLIED PHYSICS, 1989, 66 (01) :388-394

[6]

LAVERGNE DB, 1985, P SOC PHOTO-OPT INST, V539, P115

[7] THE MECHANICS OF SPIN COATING OF POLYMER-FILMS [J].

LAWRENCE, CJ .

PHYSICS OF FLUIDS, 1988, 31 (10) :2786-2795

[8] STOCHASTIC SIMULATION OF THE FLOW OF A THIN LIQUID-FILM OVER A ROUGH ROTATING-DISK [J].

MA, F ;

HWANG, JH .

JOURNAL OF APPLIED PHYSICS, 1989, 66 (10) :5026-5033

[9] DYNAMIC MEASUREMENTS OF FILM THICKNESS OVER LOCAL TOPOGRAPHY IN SPIN COATING [J].

MANSKE, LM ;

GRAVES, DB ;

OLDHAM, WG .

APPLIED PHYSICS LETTERS, 1990, 56 (23) :2348-2350

[10] CHARACTERISTICS OF RESIST FILMS PRODUCED BY SPINNING [J].

MEYERHOFER, D .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) :3993-3997