ION-BEAM MODIFICATION OF TIN FILMS DURING VAPOR-DEPOSITION

[1] INSITU AUGER-ELECTRON SPECTROSCOPY APPLIED TO THE STUDY OF CHEMISORPTION AND DIFFUSION DURING REACTIVE IMPLANTATION OF TITANIUM INTO IRON [J]. APPLIED SURFACE SCIENCE, 1986, 25 (04) : 364 - 379

[2] Bunshah R. F., 1982, DEPOSITION TECHNOLOG

[3] DAVIS LE, 1976, HDB AUGER ELECTRON S

[4] DEARNALEY G, 1986, COMMUNICATION

[5] HARPER JME, 1984, ION BOMBARDMENT MODI, P127

[6] HIRVONEN JK, 1984, COMMUNICATION

[7] ADHERENT TIN FILMS PRODUCED BY ION-BEAM ENHANCED DEPOSITION AT ROOM-TEMPERATURE [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 915 - 919

[8] Mouchan B. A., 1969, PHYS MAT METALLOG, V28, P83

[9] DIFFUSION OF NICKEL THROUGH TITANIUM NITRIDE FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2242 - 2245

[10] STRUCTURE AND PROPERTIES OF DEPOSITS GROWN BY ION-BEAM-ACTIVATED VACUUM DEPOSITION TECHNIQUES [J]. THIN SOLID FILMS, 1979, 63 (01) : 77 - 85

[1] INSITU AUGER-ELECTRON SPECTROSCOPY APPLIED TO THE STUDY OF CHEMISORPTION AND DIFFUSION DURING REACTIVE IMPLANTATION OF TITANIUM INTO IRON [J]. APPLIED SURFACE SCIENCE, 1986, 25 (04) : 364 - 379

[2] Bunshah R. F., 1982, DEPOSITION TECHNOLOG

[3] DAVIS LE, 1976, HDB AUGER ELECTRON S

[4] DEARNALEY G, 1986, COMMUNICATION

[5] HARPER JME, 1984, ION BOMBARDMENT MODI, P127

[6] HIRVONEN JK, 1984, COMMUNICATION

[7] ADHERENT TIN FILMS PRODUCED BY ION-BEAM ENHANCED DEPOSITION AT ROOM-TEMPERATURE [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 915 - 919

[8] Mouchan B. A., 1969, PHYS MAT METALLOG, V28, P83

[9] DIFFUSION OF NICKEL THROUGH TITANIUM NITRIDE FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2242 - 2245

[10] STRUCTURE AND PROPERTIES OF DEPOSITS GROWN BY ION-BEAM-ACTIVATED VACUUM DEPOSITION TECHNIQUES [J]. THIN SOLID FILMS, 1979, 63 (01) : 77 - 85