STRUCTURE AND PROPERTIES OF DEPOSITS GROWN BY ION-BEAM-ACTIVATED VACUUM DEPOSITION TECHNIQUES

被引：30

作者：

PRANEVICIUS, L

机构：

[1] Polytechnic Institute, Kaunus, Lithuania

来源：

THIN SOLID FILMS | 1979年 / 63卷 / 01期

关键词：

D O I：

10.1016/0040-6090(79)90103-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work the structures and the properties of deposits formed by ion-beam-activated vacuum deposition techniques were investigated. Information was obtained about the basic processes of film growth, the adhesion of the deposited films, and the structural and electrical properties of the deposits. Some applications of these films are discussed. The advantages, compared with other deposition methods, of using film deposition techniques activated by ion beams are given. © 1979.

引用

页码：77 / 85

页数：9

共 8 条

[1] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN [J].