SPECTROSCOPIC ANALYSIS AND CHEMICAL-KINETICS MODELING OF A DIAMOND DEPOSITION PLASMA REACTOR

The quality and the growth rate of diamond films produced in a microwave bell jar plasma reactor are strong functions of the plasma characteristics at the plasma-surface interface (temperatures, species concentrations). These local parameters are shown to be functions of the plasma operating conditions (dissociation in volume) and of the boundary conditions at the surface. Spectroscopic measurements of some plasma parameters based on coherent anti-Stokes Raman and optical emission spectroscopy are presented, the deposition results are correlated with these measurements. A zero-dimensional chemical kinetics model is developed for studying the influences of the gas temperature and the electron temperature on the production of atomic hydrogen.