INTERACTIONS BETWEEN SEQUENTIAL DOPANT DIFFUSIONS IN SILICON - REVIEW

被引：37

作者：

WILLOUGHBY, AFW ^{[1
]}

机构：

[1] UNIV SOUTHAMPTON, ENGN MAT LABS, SOUTHAMPTON SO9 5NH, HAMPSHIRE, ENGLAND

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1977年 / 10卷 / 04期

关键词：

D O I：

10.1088/0022-3727/10/4/011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：455 / 480

页数：26

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