SILICON OXIDATION STUDIES - OXIDATION OF HEAVILY B-DOPED AND P-DOPED SINGLE-CRYSTAL SILICON

被引:71
作者
IRENE, EA
DONG, DW
机构
关键词
D O I
10.1149/1.2131638
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1146 / 1151
页数:6
相关论文
共 18 条
[1]   IMPURITY REDISTRIBUTION AND JUNCTION FORMATION IN SILICON BY THERMAL OXIDATION [J].
ATALLA, MM ;
TANNENBAUM, E .
BELL SYSTEM TECHNICAL JOURNAL, 1960, 39 (04) :933-946
[2]  
BRAY PJ, 1960, MODERN ASPECTS VITRE, pCH5
[3]   METASTABLE IMMISCIBILITY IN B2O3-SIO2 SYSTEM [J].
CHARLES, RJ ;
WAGSTAFF, FE .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1968, 51 (01) :16-&
[4]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[5]   THERMAL OXIDATION OF HEAVILY DOPED SILICON [J].
DEAL, BE ;
SKLAR, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) :430-+
[6]   OBSERVATION OF IMPURITY REDUSTRIBUTION DURING THERMAL OXIDATION OF SILICON USING MOS STRUCTURE [J].
DEAL, BE ;
GROVE, AS ;
SNOW, EH ;
SAH, CT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (03) :308-&
[7]  
DOREMUS RH, 1973, GLASS SCI, pCH3
[8]   DIFFUSIVITY SUMMARY OF B, GA, P, AS, AND SB IN SIO2 [J].
GHEZZO, M ;
BROWN, DM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (01) :146-148
[9]   REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON [J].
GROVE, AS ;
SAH, CT ;
LEISTIKO, O .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2695-&
[10]   Silicon Oxidation Studies: The Role of H2O [J].
Irene, E. A. ;
Ghez, R. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) :1757-1761