MARK DETECTION FOR ALIGNMENT AND REGISTRATION IN A HIGH-THROUGHPUT PROJECTION ELECTRON LITHOGRAPHY TOOL

被引:11
作者
FARROW, RC
LIDDLE, JA
BERGER, SD
HUGGINS, HA
KRAUS, JS
CAMARDA, RM
JURGENSEN, CW
KOLA, RR
FETTER, L
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期
关键词
D O I
10.1116/1.586001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The design considerations and performance requirements of an alignment and registration method for high-throughput projection electron lithography are discussed. We have devised a mark detection system for a lithography tool employing the SCALPEL principle. The process involves scanning the image of a mark from a mask, over a mark that is fabricated on a wafer and measuring the integrated backscattered-electron intensity. Using a mark that consists of equally spaced lines of tungsten on silicon, we have investigated the effects of spatial and rotational misalignment, and focus in a small field of view SCALPEL machine. We have modeled these and other effects and found agreement between experimental and theoretical results. The measured precision of estimating position from the experimental data is approximately 10 nm. By extrapolation we believe that in a practical lithography machine this value can be improved significantly.
引用
收藏
页码:2780 / 2783
页数:4
相关论文
共 7 条
  • [1] PROJECTION ELECTRON-BEAM LITHOGRAPHY - A NEW APPROACH
    BERGER, SD
    GIBSON, JM
    CAMARDA, RM
    FARROW, RC
    HUGGINS, HA
    KRAUS, JS
    LIDDLE, JA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2996 - 2999
  • [2] ALIGNMENT AND REGISTRATION SCHEMES FOR PROJECTION ELECTRON LITHOGRAPHY
    FARROW, RC
    BERGER, SD
    GIBSON, JM
    LIDDLE, JA
    KRAUS, JS
    CAMARDA, RM
    HUGGINS, HA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3582 - 3585
  • [3] ALIGNED MULTILAYER STRUCTURE GENERATION BY ELECTRON MICRO-PROJECTION
    FROSIEN, J
    LISCHKE, B
    ANGER, K
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1827 - 1829
  • [4] ELECTRON-PROJECTION MICROFABRICATION SYSTEM
    HERITAGE, MB
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1135 - 1145
  • [5] CHOICE OF SYSTEM PARAMETERS FOR PROJECTION ELECTRON-BEAM LITHOGRAPHY - ACCELERATING VOLTAGE AND DEMAGNIFICATION FACTOR
    LIDDLE, JA
    BERGER, SD
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2776 - 2779
  • [6] MASK FABRICATION FOR PROJECTION ELECTRON-BEAM LITHOGRAPHY INCORPORATING THE SCALPEL TECHNIQUE
    LIDDLE, JA
    HUGGINS, HA
    BERGER, SD
    GIBSON, JM
    WEBER, G
    KOLA, R
    JURGENSEN, CW
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3000 - 3004
  • [7] AN ELECTRON-BEAM INSPECTION SYSTEM FOR X-RAY MASK PRODUCTION
    SANDLAND, P
    MEISBURGER, WD
    CLARK, DJ
    SIMMONS, RR
    SMITH, DEA
    VENEKLASEN, LH
    BECKER, BG
    BRODIE, AD
    CHADWICK, CH
    CHEN, ZW
    CHUU, LS
    EMGE, DG
    DESAI, AA
    DOHSE, HJ
    DUTTA, A
    GREENE, JD
    HONFI, LA
    JAU, JY
    LELE, SG
    LING, MY
    MCMURTRY, JE
    PAUL, RE
    PAN, CS
    ROBINSON, M
    ROUGH, JKH
    TAYLOR, J
    WIECZOREK, PA
    WONG, SC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3005 - 3009