OXIDATION OF CVD SI3N4 AT 1550-DEGREES TO 1650-DEGREES C

被引：70

作者：

HIRAI, T

NIIHARA, K

GOTO, T

机构：

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1980年 / 63卷 / 7-8期

关键词：

D O I：

10.1111/j.1151-2916.1980.tb10204.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：419 / 424

页数：6

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