SELF-INTERSTITIAL BONDING CONFIGURATIONS IN GAAS AND SI

被引:73
作者
CHADI, DJ
机构
[1] NEC Research Institute, Princeton
来源
PHYSICAL REVIEW B | 1992年 / 46卷 / 15期
关键词
D O I
10.1103/PhysRevB.46.9400
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The charge-state-dependent stable and low-energy metastable states of self-interstitial defects in GaAs and Si are identified via self-consistent pseudopotential calculations. An unconventional type of [110]-split-interstitial configuration in which there is essentially no bonding between the split interstitials is found to play an important role in determining the ground-state properties of interstitials for several charge states. Self-interstitials in GaAs are found to be "negative-U" defects. They are characterized by effective U's of -0.2 eV for Ga and -0.7 eV for As interstitials. The large negative-U value for As interstitials may explain why no magnetic resonance identification of As interstitials has been achieved in GaAs.
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页码:9400 / 9407
页数:8
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