EFFICIENT LIGHT-EMISSION BY IMPACT IONIZATION IN SINGLE-BARRIER TUNNELING DEVICES

被引:10
作者
SNOW, ES
KIRCHOEFER, SW
CAMPBELL, PM
GLEMBOCKI, OJ
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D O I
10.1063/1.101147
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O59 [应用物理学];
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页码:2124 / 2126
页数:3
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共 8 条
[1]   DISTRIBUTION FUNCTIONS AND IONIZATION RATES FOR HOT ELECTRONS IN SEMICONDUCTORS [J].
BARAFF, GA .
PHYSICAL REVIEW, 1962, 128 (06) :2507-&
[3]   EPITAXY OF SILICON DOPED GALLIUM ARSENIDE BY MOLECULAR BEAM METHOD [J].
CHO, AY ;
HAYASHI, I .
METALLURGICAL TRANSACTIONS, 1971, 2 (03) :777-&
[4]   TEMPERATURE DEPENDENCE OF AVALANCHE MULTIPLICATION IN SEMICONDUCTORS [J].
CROWELL, CR ;
SZE, SM .
APPLIED PHYSICS LETTERS, 1966, 9 (06) :242-&
[5]   RESONANT FOWLER-NORDHEIM TUNNELING IN N-GAAS-UNDOPED ALXGA1-XAS-N+GAAS CAPACITORS [J].
HICKMOTT, TW ;
SOLOMON, PM ;
FISCHER, R ;
MORKOC, H .
APPLIED PHYSICS LETTERS, 1984, 44 (01) :90-92
[6]  
LOGAN RA, 1966, J PHYS SOC JPN, VS 21, P434
[7]   BAND-STRUCTURE-DEPENDENT TRANSPORT AND IMPACT IONIZATION IN GAAS [J].
SHICHIJO, H ;
HESS, K .
PHYSICAL REVIEW B, 1981, 23 (08) :4197-4207
[8]   BAND-STRUCTURE DEPENDENT IMPACT IONIZATION IN SILICON AND GALLIUM-ARSENIDE [J].
TANG, JY ;
SHICHIJO, H ;
HESS, K ;
IAFRATE, GJ .
JOURNAL DE PHYSIQUE, 1981, 42 (NC7) :63-69