SPUTTERED ALLOY COATINGS BY CODEPOSITION - EFFECTS OF BIAS VOLTAGE

被引：22

作者：

MAWELLA, KJA

SHEWARD, JA

机构：

来源：

THIN SOLID FILMS | 1990年 / 193卷 / 1-2期

关键词：

D O I：

10.1016/S0040-6090(05)80008-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The structure of most sputtered refractory metal coatings produced at low substrate temperatures consists of columnar grains with open boundaries, owing to self-shadowing effects caused by the low adatom mobility. It was shown that self-shadowing effects can be reduced by depositing two metals with dissimilarly sized atoms. Within a certain composition range, an alloy of niobium and chromium produced coatings comprising a dense fine columnar grain structure. Further improvement in structure has been demonstrated by the application of a bias voltage to the substrate during deposition. At - 100 V bias, the packing density was enhanced and a coating containing a non-columnar grain structure was obtained. The improved performance due to this optimum structure was shown by thermal shock tests.

引用

页码：27 / 33

页数：7