CHEMICAL SPUTTERING YIELDS OF SILICON RESULTING FROM F+,CFN+(N=1,2,3)ION BOMBARDMENT

被引:45
作者
MIYAKE, K
TACHI, S
YAGI, K
TOKUYAMA, T
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10.1063/1.331021
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O59 [应用物理学];
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页码:3214 / 3219
页数:6
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