CHEMICAL SPUTTERING YIELDS OF SILICON RESULTING FROM F+,CFN+(N=1,2,3)ION BOMBARDMENT

被引：45

作者：

MIYAKE, K

TACHI, S

YAGI, K

TOKUYAMA, T

机构：

来源：

关键词：

D O I：

10.1063/1.331021

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3214 / 3219

页数：6

共 16 条

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[14] LOW-ENERGY MASS-SEPARATED ION-BEAM DEPOSITION OF MATERIALS
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TACHI, S
[J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 241 - 250
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