TRENDS IN ADVANCED PROCESS TECHNOLOGY - SUBMICROMETER CMOS DEVICE DESIGN AND PROCESS REQUIREMENTS

被引：19

作者：

BROWN, DM

GHEZZO, M

PIMBLEY, JM

机构：

[1] GE, Schenectady, NY, USA, GE, Schenectady, NY, USA

来源：

关键词：

D O I：

10.1109/PROC.1986.13685

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

137

引用

页码：1678 / 1702

页数：25

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