STRIPE-GEOMETRY ALXGA1-XAS-GAAS QUANTUM-WELL LASERS VIA HYDROGENATION

被引:29
作者
JACKSON, GS
PAN, N
FENG, MS
STILLMAN, GE
HOLONYAK, N
BURNHAM, RD
机构
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
[2] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
关键词
D O I
10.1063/1.98577
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1629 / 1631
页数:3
相关论文
共 13 条
[1]  
Casey jr H. C., 1978, HETEROSTRUCTURE LA B, P9
[2]   GAIN-INDUCED GUIDING AND ASTIGMATIC OUTPUT BEAM OF GAAS LASERS [J].
COOK, DD ;
NASH, FR .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (04) :1660-1672
[3]   LOW-THRESHOLD DISORDER-DEFINED BURIED-HETEROSTRUCTURE ALXGA1-XAS-GAAS QUANTUM WELL LASERS [J].
DEPPE, DG ;
HSIEH, KC ;
HOLONYAK, N ;
BURNHAM, RD ;
THORNTON, RL .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (12) :4515-4520
[4]  
DUPUIS RD, 1979, 7TH P INT S GAAS REL, P1
[5]   OPTICAL AND ELECTRICAL PROPERTIES OF PROTON-BOMBARDED P-TYPE GAAS [J].
DYMENT, JC ;
NORTH, JC ;
DASARO, LA .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) :207-213
[6]   HYDROGEN PASSIVATION OF SHALLOW-ACCEPTOR IMPURITIES IN PARA-TYPE GAAS [J].
JOHNSON, NM ;
BURNHAM, RD ;
STREET, RA ;
THORNTON, RL .
PHYSICAL REVIEW B, 1986, 33 (02) :1102-1105
[7]   METALORGANIC CHEMICAL VAPOR-DEPOSITION OF III-V SEMICONDUCTORS [J].
LUDOWISE, MJ .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (08) :R31-R55
[8]   PASSIVATION OF SI DONORS AND DX CENTERS IN ALGAAS BY HYDROGEN PLASMA EXPOSURE [J].
NABITY, JC ;
STAVOLA, M ;
LOPATA, J ;
DAUTREMONTSMITH, WC ;
TU, CW ;
PEARTON, SJ .
APPLIED PHYSICS LETTERS, 1987, 50 (14) :921-923
[9]   SI DONOR NEUTRALIZATION IN HIGH-PURITY GAAS [J].
PAN, N ;
LEE, B ;
BOSE, SS ;
KIM, MH ;
HUGHES, JS ;
STILLMAN, GE ;
ARAI, K ;
NASHIMOTO, Y .
APPLIED PHYSICS LETTERS, 1987, 50 (25) :1832-1834
[10]   HYDROGEN PASSIVATION OF C ACCEPTORS IN HIGH-PURITY GAAS [J].
PAN, N ;
BOSE, SS ;
KIM, MH ;
STILLMAN, GE ;
CHAMBERS, F ;
DEVANE, G ;
ITO, CR ;
FENG, M .
APPLIED PHYSICS LETTERS, 1987, 51 (08) :596-598